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EMMI, sometimes called PEM - Photon Emission Microscopy, is one of the most commonly used method in semiconductor fault isolation. EMMI inspection will use CCD camera to detect any light/photon emitted from the biased the device. It is excellent tools to locate leakage current point. However, with the development of low/ultra-low power device with increasing complexity of the semiconductor device, EMMI is less likely of locating the failure point.

Specifications Applications

- InGaAs detector
- Lens 0.8x, 2.5x, 5x, 20x, 50x, 100x
- 12” wafer probe station
- Probe card integration
- Thermal stage -20°C to 120°C

- ESD damage localization
- p-n junction leakage
- MOSFET short
- Latch-up localization
- Pressure resistance defect
- Wafer backside analysis