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XPS (X-ray Photoelectron Spectroscopy)

  • X-ray Photoelectron Spectroscopy is qualitative surface analysis technique that can characterize the surface chemistry of materials (chemical state and concentration).
  • X-rays are focused onto material, and then measure the emitted electrons intensity and energy from the top 1-10nm of the surface.
  • Quantified elemental depth profiling through layers can provide both layer and contamination intensities.

Specifications Applications

- Beam size: 7.5-200 um
- Lateral resolution: 10 µm
- Depth resolution: 1.0 nm
- Energy resolution: 0.48 eV
- Detected element: Li - U
- Sensitivity: 0.1-1.0 at%

- Surface analysis of inorganic and organic materials, contamination, stains or residues
- Quantification of surface elemental composition
- Determination of chemical state/bonding information
- Depth profiling for thin film/material composition
- Film/material and oxide thickness measurement

More information: http://en.wikipedia.org/wiki/X-ray_photoelectron_spectroscopy