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Dual Beam FIB (Focused Ion Beam)

  • Focused Ion Beam (FIB) is a versatile analysis technique that can be used to expose hidden defects in a variety of substrates.
  • A common application is to prepare samples for TEM analysis using the lift-out technique.
  • Another application of FIB is in circuit editing. Electrical connections can be cut and re-routed within the FIB system.

Specifications Application

- Ga liguid metal ion source, Ga LMIS
- Resolution 5nm at 30kV
- Accelarating voltage 0.5 – 30kV
- Beam current 1.5 pA – 20 nA
- EDX system Oxford Instruments
- EBSD system Oxford Instruments

- Electro and Ion Beam Imaging
- Micro and Nano Patterning
- Site Specific Cross-sectioning
- Site Specific Deposition
- IC Circuit Editing
- 3D Progressive Milling
- 3D L-Shape Milling
- TEM Sample Preparation



FIB cross-sectioning in process debug


Sn whisker growing mechanism studies


FIB/TEM Lift-Off Technology


More information: http://en.wikipedia.org/wiki/Focused_ion_beam